Ciencia e Ingeniería de los Materiales
TEP120
Universidade de Lisboa
Lisboa, PortugalPublicaciones en colaboración con investigadores/as de Universidade de Lisboa (12)
2020
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Interfacial integrity enhancement of atomic layer deposited alumina on boron doped diamond by surface plasma functionalization
Surface and Coatings Technology, Vol. 397
2016
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Direct Measurement of Polarization-Induced Fields in GaN/AlN by Nano-Beam Electron Diffraction
Scientific Reports, Vol. 6
2015
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Analysis of the stability of InGaN/GaN multiquantum wells against ion beam intermixing
Nanotechnology, Vol. 26, Núm. 42
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Quantitative Chemical Mapping of InGaN Quantum Wells from Calibrated High-Angle Annular Dark Field Micrographs
Microscopy and Microanalysis, Vol. 21, Núm. 4, pp. 994-1005
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The Role of Edge Dislocations on the Red Luminescence of ZnO Films Deposited by RF-Sputtering
Journal of Nanomaterials, Vol. 2015
2014
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ZnO micro/nanocrystals grown by laser assisted flow deposition
Proceedings of SPIE - The International Society for Optical Engineering
2013
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Selective ion-induced intermixing and damage in low-dimensional GaN/AlN quantum structures
Nanotechnology, Vol. 24, Núm. 50
2012
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Damage formation in GaN under medium energy range implantation of rare earth ions: A combined TEM, XRD and RBS/C investigation
Materials Research Society Symposium Proceedings
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Mechanisms of damage formation in Eu-implanted AlN
Journal of Applied Physics, Vol. 112, Núm. 7
2011
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A mechanism for damage formation in GaN during rare earth ion implantation at medium range energy and room temperature
Journal of Applied Physics, Vol. 109, Núm. 1
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Mechanisms of damage formation in Eu-implanted GaN probed by X-ray diffraction
EPL, Vol. 96, Núm. 4
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The high sensitivity of InN under rare earth ion implantation at medium range energy
Journal of Physics D: Applied Physics, Vol. 44, Núm. 29