X-ray topography study of monocrystalline silicon wafers diffused with phosphorus by different methods

  1. Vallejo, B.
  2. González-Mañas, M.
  3. Caballero, M.A.
Revue:
Applied Physics A: Materials Science and Processing

ISSN: 0947-8396,  1432-0630

Année de publication: 2013

Volumen: 113

Número: 2

Pages: 531-536

Type: Article

DOI: 10.1007/S00339-013-7564-Z GOOGLE SCHOLAR
La source de données: Scopus