Optical absorption in amorphous hydrogenated silicon nitride thin films deposited by the electron cyclotron resonance plasma method and subjected to rapid thermal annealing

  1. Martínez, F.L.
  2. Mártil, I.
  3. González-Díaz, G.
  4. Bernal-Oliva, A.M.
  5. González-Leal, J.M.
  6. Márquez, E.
Revista:
Thin Solid Films

ISSN: 0040-6090

Ano de publicación: 1999

Volume: 343-344

Número: 1-2

Páxinas: 433-436

Tipo: Artigo

DOI: 10.1016/S0040-6090(98)01669-1 GOOGLE SCHOLAR