A mechanism for damage formation in GaN during rare earth ion implantation at medium range energy and room temperature

  1. Ruterana, P.
  2. Lacroix, B.
  3. Lorenz, K.
Zeitschrift:
Journal of Applied Physics

ISSN: 0021-8979

Datum der Publikation: 2011

Ausgabe: 109

Nummer: 1

Art: Artikel

DOI: 10.1063/1.3527944 GOOGLE SCHOLAR