A mechanism for damage formation in GaN during rare earth ion implantation at medium range energy and room temperature

  1. Ruterana, P.
  2. Lacroix, B.
  3. Lorenz, K.
Aldizkaria:
Journal of Applied Physics

ISSN: 0021-8979

Argitalpen urtea: 2011

Alea: 109

Zenbakia: 1

Mota: Artikulua

DOI: 10.1063/1.3527944 GOOGLE SCHOLAR