RAMON
ESCOBAR GALINDO
Investigador en el periodo 2017-2019
Centro Nacional de Aceleradores
Sevilla, EspañaPublicaciones en colaboración con investigadores/as de Centro Nacional de Aceleradores (3)
2016
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High-Rate Deposition of Stoichiometric Compounds by Reactive Magnetron Sputtering at Oblique Angles
Plasma Processes and Polymers, Vol. 13, Núm. 10, pp. 960-964
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Stoichiometric Control of SiOx Thin Films Grown by Reactive Magnetron Sputtering at Oblique Angles
Plasma Processes and Polymers, Vol. 13, Núm. 12, pp. 1242-1248
2007
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Influence of the yttria content on the mechanical properties of Y2O3-ZrO2 thin films prepared by EB-PVD
Vacuum, Vol. 81, Núm. 11-12, pp. 1457-1461