Deposition of CAP/antioxidants systems on silica particles using the supercritical antisolvent process

  1. García-Casas, I.
  2. Montes, A.
  3. Valor, D.
  4. Pereyra, C.
  5. de la Ossa, E.J.M.
Aldizkaria:
Applied Sciences (Switzerland)

ISSN: 2076-3417

Argitalpen urtea: 2020

Alea: 10

Zenbakia: 13

Mota: Artikulua

DOI: 10.3390/APP10134576 GOOGLE SCHOLAR lock_openSarbide irekia editor