Stoichiometric Control of SiOx Thin Films Grown by Reactive Magnetron Sputtering at Oblique Angles

  1. Garcia-Valenzuela, A.
  2. Alvarez, R.
  3. Lopez-Santos, C.
  4. Ferrer, F.J.
  5. Rico, V.
  6. Guillen, E.
  7. Alcon-Camas, M.
  8. Escobar-Galindo, R.
  9. Gonzalez-Elipe, A.R.
  10. Palmero, A.
Aldizkaria:
Plasma Processes and Polymers

ISSN: 1612-8869 1612-8850

Argitalpen urtea: 2016

Alea: 13

Zenbakia: 12

Orrialdeak: 1242-1248

Mota: Artikulua

DOI: 10.1002/PPAP.201600077 GOOGLE SCHOLAR