High-Rate Deposition of Stoichiometric Compounds by Reactive Magnetron Sputtering at Oblique Angles

  1. Alvarez, R.
  2. Garcia-Valenzuela, A.
  3. Lopez-Santos, C.
  4. Ferrer, F.J.
  5. Rico, V.
  6. Guillen, E.
  7. Alcon-Camas, M.
  8. Escobar-Galindo, R.
  9. Gonzalez-Elipe, A.R.
  10. Palmero, A.
Journal:
Plasma Processes and Polymers

ISSN: 1612-8869 1612-8850

Year of publication: 2016

Volume: 13

Issue: 10

Pages: 960-964

Type: Article

DOI: 10.1002/PPAP.201600019 GOOGLE SCHOLAR