High-Rate Deposition of Stoichiometric Compounds by Reactive Magnetron Sputtering at Oblique Angles
- Alvarez, R.
- Garcia-Valenzuela, A.
- Lopez-Santos, C.
- Ferrer, F.J.
- Rico, V.
- Guillen, E.
- Alcon-Camas, M.
- Escobar-Galindo, R.
- Gonzalez-Elipe, A.R.
- Palmero, A.
ISSN: 1612-8869, 1612-8850
Année de publication: 2016
Volumen: 13
Número: 10
Pages: 960-964
Type: Article