High-quality carbon nanotube growth at low temperature by pulse-excited remote plasma chemical vapor deposition

  1. Yamazaki, Y.
  2. Sakuma, N.
  3. Katagiri, M.
  4. Suzuki, M.
  5. Sakai, T.
  6. Sato, S.
  7. Nihei, M.
  8. Awano, Y.
Revue:
Applied Physics Express

ISSN: 1882-0778,  1882-0786

Année de publication: 2008

Volumen: 1

Número: 3

Pages: 0340041-0340043

Type: Article

DOI: 10.1143/APEX.1.034004 GOOGLE SCHOLAR
La source de données: Scopus