Atomic scale strain relaxation in axial semiconductor III-V nanowire heterostructures

  1. De La Mata, M.
  2. Magén, C.
  3. Caroff, P.
  4. Arbiol, J.
Journal:
Nano Letters

ISSN: 1530-6992 1530-6984

Year of publication: 2014

Volume: 14

Issue: 11

Pages: 6614-6620

Type: Article

DOI: 10.1021/NL503273J GOOGLE SCHOLAR lock_openOpen access editor