High temperature AlN intermediate layer in GaN grown by molecular beam epitaxy

  1. Stemmer, J.
  2. Fedler, F.
  3. Klausing, H.
  4. Mistele, D.
  5. Rotter, T.
  6. Semchinova, O.
  7. Aderhold, J.
  8. Sanchez, A.M.
  9. Pacheco, F.J.
  10. Molina, S.I.
  11. Fehrer, M.
  12. Hommel, D.
  13. Graul, J.
Journal:
Journal of Crystal Growth

ISSN: 0022-0248

Year of publication: 2000

Volume: 216

Issue: 1

Pages: 15-20

Type: Article

DOI: 10.1016/S0022-0248(00)00468-1 GOOGLE SCHOLAR