High temperature AlN intermediate layer in GaN grown by molecular beam epitaxy

  1. Stemmer, J.
  2. Fedler, F.
  3. Klausing, H.
  4. Mistele, D.
  5. Rotter, T.
  6. Semchinova, O.
  7. Aderhold, J.
  8. Sanchez, A.M.
  9. Pacheco, F.J.
  10. Molina, S.I.
  11. Fehrer, M.
  12. Hommel, D.
  13. Graul, J.
Revue:
Journal of Crystal Growth

ISSN: 0022-0248

Année de publication: 2000

Volumen: 216

Número: 1

Pages: 15-20

Type: Article

DOI: 10.1016/S0022-0248(00)00468-1 GOOGLE SCHOLAR