High temperature AlN intermediate layer in GaN grown by molecular beam epitaxy

  1. Stemmer, J.
  2. Fedler, F.
  3. Klausing, H.
  4. Mistele, D.
  5. Rotter, T.
  6. Semchinova, O.
  7. Aderhold, J.
  8. Sanchez, A.M.
  9. Pacheco, F.J.
  10. Molina, S.I.
  11. Fehrer, M.
  12. Hommel, D.
  13. Graul, J.
Aldizkaria:
Journal of Crystal Growth

ISSN: 0022-0248

Argitalpen urtea: 2000

Alea: 216

Zenbakia: 1

Orrialdeak: 15-20

Mota: Artikulua

DOI: 10.1016/S0022-0248(00)00468-1 GOOGLE SCHOLAR