Comparison of the Material Quality of AlxIn1−xN (x—0–0.50) Films Deposited on Si(100) and Si(111) at Low Temperature by Reactive RF Sputtering
- Sun, M.
- Blasco, R.
- Nwodo, J.
- de la Mata, M.
- Molina, S.I.
- Ajay, A.
- Monroy, E.
- Valdueza-Felip, S.
- Naranjo, F.B.
Zeitschrift:
Materials
ISSN: 1996-1944
Datum der Publikation: 2022
Ausgabe: 15
Nummer: 20
Art: Artikel
