Comparison of the Material Quality of AlxIn1−xN (x—0–0.50) Films Deposited on Si(100) and Si(111) at Low Temperature by Reactive RF Sputtering

  1. Sun, M.
  2. Blasco, R.
  3. Nwodo, J.
  4. de la Mata, M.
  5. Molina, S.I.
  6. Ajay, A.
  7. Monroy, E.
  8. Valdueza-Felip, S.
  9. Naranjo, F.B.
Journal:
Materials

ISSN: 1996-1944

Year of publication: 2022

Volume: 15

Issue: 20

Type: Article

DOI: 10.3390/MA15207373 GOOGLE SCHOLAR lock_openOpen access editor
Data source: Scopus