Comparison of the Material Quality of AlxIn1−xN (x—0–0.50) Films Deposited on Si(100) and Si(111) at Low Temperature by Reactive RF Sputtering

  1. Sun, M.
  2. Blasco, R.
  3. Nwodo, J.
  4. de la Mata, M.
  5. Molina, S.I.
  6. Ajay, A.
  7. Monroy, E.
  8. Valdueza-Felip, S.
  9. Naranjo, F.B.
Aldizkaria:
Materials

ISSN: 1996-1944

Argitalpen urtea: 2022

Alea: 15

Zenbakia: 20

Mota: Artikulua

DOI: 10.3390/MA15207373 GOOGLE SCHOLAR lock_openSarbide irekia editor
Datuen iturria: Scopus